Question

STATEMENT 1: PMMA (Polymethyl methacrylate) is used for making lenses and light covers.
STATEMENT 2: It has excellent light transmission properties.
A) STATEMENT 1 is true, STATEMENT 2 is true, STATEMENT 2 is a correct explanation for STATEMENT 1.
B) STATEMENT 1 is true, STATEMENT 2 is true, STATEMENT 2 is NOT a correct explanation for STATEMENT 1.
C) STATEMENT 1 is true, STATEMENT 2 is false.
D) STATEMENT 1 is false, STATEMENT 2 is true.

Answer 1

Hint: Polymethyl methacrylate is a synthetic resin which is produced from the polymerization of methyl methacrylate. Here both statements are true. Polymethyl methacrylate is used for making lenses and light covers because it has excellent light transmission properties.

Complete step by step answer
Polymethyl methacrylate is a transparent and rigid plastic. It is mainly used as a substitute for glass products such as shatterproof windows, skylights, illuminated signs, and aircraft canopies.
It is an ester of methacrylic acid having the chemical formula $ \{ C{H_2} = C(C{H_3})C{O_2}H\} $ . It belongs to the important acrylic family of resins. It is obtained principally from propylene, which is a compound refined from the lighter part of crude oil. Propylene and benzene are treated together to form cumene that is isopropylbenzene. The cumene gets oxidized to form cumene hydroperoxide. Cumin hydroperoxide is treated with acid to form acetone. That acetone gets converted in a three-step process to methyl methacrylate $ \{ C{H_2} = C(C{H_3})C{O_2}H\} $ it is a flammable liquid. Due to its aforementioned biocompatibility, It is generally used in modern dentistry such as in the fabrication of dental prosthetics, artificial teeth, and so on.
Hence, STATEMENT 1 is true, STATEMENT 2 is true and STATEMENT 2 is a correct explanation for STATEMENT 1.
So, option A is correct.

Note
It is also used in semiconductor as a resistor in the electron beam lithography process. A solution consisting of the polymer in a solvent is used to spin coat silicon and other semiconducting and semi-insulating wafers with a thin film. Patterns on this can be made by an electron beam that is deep UV light.